研制了一种新的大面积微波等离子体源。
A new large area microwave plasma source has been developed.
本文介绍微波等离子体刻蚀应用的实验结果。
In this paper, the result of etching application with microwave plasma will be introduced.
该方法有助于微波等离子体特性的研究和实现快速阻抗调配。
The method is useful to the study of microwave plasma characterization and the realization of fast impedance matching.
本发明是用微波等离子体矩作电离源的一种新型离子化色谱检测器。
This invention is a chromatographic detector in which the ion source is a microwave plasma torch.
以镍为催化剂，利用微波等离子体化学气相沉积法制备了弹簧状碳纤维。
Under the catalytic effect of nickel particles, spring-like carbon filaments were synthesized through microwave plasma chemical vapor deposition.
以镍为催化剂，利用微波等离子体化学气相沉积法制备了弹簧状碳纤维。
The globe-like diamond microcrystalline aggregates were fabricated by microwave plasma chemical vapor deposition (MPCVD) method.
着重总姑了微波等离子体技术、水等离子体技术、填充床等离子体技术等。
Such technologies as microwave plasma, water plasma and packed-bed plasma were discussed.
本研究设计了一套微波等离子体反应器，在大气压下激发并维持稳定的等离子体。
In this study, the microwave plasma device is designed to excite and maintain stable plasma on atmospheric press.
报道了对多孔硅进行后处理的一种新方法，即真空中微波等离子体辅助的硫钝化处理。
A new method for post treatment of porous silicon, sulfur passivation by microwave plasma assistance in vacuum, is reported in this paper.
以镍片为基板材料，利用微波等离子体化学气相沉积法在低温条件下合成了纳米碳管膜。
Carbon nanotube films were synthesized on Ni substrate by microwave plasma chemical vapor deposition at low temperature.
耦合电子、离子运动的流体方程，对微波等离子体的初始形成过程进行了数值模拟计算。
Coupled with fluid equations for the electron and ion motion, the microwave discharge courses are calculated.
本发明提供能够在处理基体上形成均匀的薄膜的微波等离子体处理装置和气体供给构件。
A microwave plasma processing device and a gas supply member capable of forming a uniform thin film on a substrate to be processed.
在微波等离子体化学气相沉积金刚石膜时，采用负偏压使氢和硼离子轰击金刚石膜表面。
The hydrogen and boron ion bombardments were performed by applying a negative bias voltage to the substrate during microwave plasma chemical vapor deposition process.
结果表明，微波等离子体烧结技术与常规法相比，其烧结时间明显缩短，性能有所改善。
The result indicates that the microwave plasma sintering can short the sintering time and improve the properties of CaZrO3 ceramics as compared with the routine methods.
本文系统研究了石英钟罩式微波等离子体辅助化学气相沉积装置对沉积金刚石薄膜的影响。
In this paper diamond films were deposited using bell-jar type microwave plasma assisted CVD system.
利用微波等离子体化学气相沉积(CVD)设备，在硅基片上进行了金刚石薄膜的沉积实验。
The experiment of the deposition of diamond thin films is made on silicon substrate by using microwave plasma chemical vapor deposition (CVD) system.
采用绞状缠绕式的热电偶计工作在打火功率以下时，测量了不同反应压强下的微波等离子体空间温度。
Under striking power, the temperature of microwave plasmas interspace with different reaction pressure was measured by the intertwined thermocouple.
本文采用微波等离子体cvd法制备定向生长的金刚石薄膜。用冷离子注入法对金刚石薄膜进行硼掺杂。
The diamond films were fabricated by microwave plasma CVD and the boron-doped was created by the cold ion implantation.
本文首先简单介绍了微波的特性及产生，然后着重阐述了微波热效应和微波等离子体在钢铁冶金中的应用和展望。
The application and prospect about microwave heating and microwave plasm in ferrous metallurgy are emphatically described after simple description on microwave characters and microwave formation.
在微波等离子体化学气相沉积装置中，研究了负偏压形核对金刚石薄膜与WC 6 %硬质合金刀具附着力的影响。
The influence of bias enhanced nucleation(BEN) to the adhesion between diamond coating and WC-6%Co carbide cutting tool is researched with the microwave plasma (CVD) instrument.
报道了一种改进型的微波等离子体增强辉光放电(MPEGD)光源，并将这种级联光源用于固体导电样品的分析。
A novel microwave plasma-enhanced glow discharge (MPEGD) lamp was used as excitation source for the analysis of solid samples.
等离子体400和660系列是低压微波等离子体应用于提高模具粘合，引线的焊接，特别是清洗高级的芯片封装。
Plasma systems 400 and 660 are low-pressure microwave plasma systems for cleaning advanced chip packages prior to die attach, wire bond and encapsulation.
本论文的研究内容有两个方面：（1）微波等离子体催化的甲烷偶联反应，（2）传统技术催化乙炔加氢转化为乙烯。
This paper has two parts: (1) methane coupling under microwave plasma catalysis, (2) acetylene conversion into ethylene under conventional method.
提出了一种新颖的多孔硅表面钝化技术，即采用微波等离子体辅助的化学气相沉积（MPCVD）方法在多孔硅上沉积金刚石薄膜。
A novel passivation technology of porous silicon (PS) surface, i. e. , depositing diamond film on the PS surface by microwave plasma assisted chemical vapor deposition (MPCVD) method, was developed.
利用微波等离子体化学气相沉积方法，以H 2、CH4和八甲基环四硅氧烷(D4)为原料，在硬质合金基体上沉积了金刚石涂层。
Diamond coatings were deposited on cemented carbide substrates with H2, CH4 and D4 as precursors by using microwave plasma chemical vapor deposition technique.
分别使用常规消解方法与微波消解方法处理海带样品，采用微波等离子体炬原子发射光谱法（MPT-AES）测定海带中钙和锌的含量。
Microwave plasma torch atomic emission spectrometry(MPT-AES) was used to determine the content of calcium and zinc in kelp after being digested.
基于流动注射-在线柱预浓集-微波等离子体炬原子发射光谱，对在线浓集测定流路和各种测试条件进行优选，建立了一种测定痕量铜的新方法。
A new method for determining trace-level copper ion was proposed based on flow-injection on-line preconcentration and microwave plasma torch atomic emission spectrometry.
利用电子回旋共振（ECR）微波等离子体辅助化学气相沉积技术、工作气氛为丙酮，在光学玻璃衬底上得到了光滑、致密、均匀的类金刚石薄膜。
Smoothing, dense and uniform nano crystalline diamond like carbon films are prepared by using electron cyclotron resonance (ECR) microwave acetone plasma chemical vapor deposition (CVD) method.
实验表明，这种微波放电装置是产生长程均匀放电激光等离子体柱的一种有效方法。
The experiment results show that this microwave discharge design is adequate to excite long uniform plasma column for gas lasers.
提出了一种用于高功率微波武器系统的光致大气等离子体通道天线(PCA)，并分析了P CA所传播一般模式的传播特性。
In this paper, a laser induced air plasma channel antenna (PCA) for high power microwave weapon is presented, and the dispersive characteristic for normal modes of PCA is analyzed.
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