通过低温退火，可以获得质量优于高温退火的顶部硅层。
The quality of top silicon layer formed by anneal at low temperature may be better than that at high temperature.
低温退火可以避免在顶部硅层中氧沉淀及延伸位错等缺陷的形成。
The formation of oxygen precipitates and threading dislocations in top Si layer could be avoided by low temperature annealing.
论文还研究了不同退火工艺条件对薄膜应力的影响，可以实现薄膜低温退火。
The affection of different annealing process conditions on TiN film stress is also researched, low temperature annealing of film can be realized.
材料在自然时效与低温退火过程中，有沉淀强化效应产生，但导电率基本保持稳定。
There are precipitation strengthening effect during nature aging and low-temperature annealing, however, the conductivity remains stable basically.
硬度能做到61——65hrc成熟工艺是：铸造后软化退火，便于加工，加工后空冷淬火加低温去应力回火。
Hardness can do 61 — 65hrc maturation process is: annealing, softening after casting machining, machining of air cooling after quenching and low temperature stress tempering.
运用高温-低温-高温三步退火的本征吸除工艺研究了锗的存在对硅片清洁区形成的影响。
The effect of Ge doped in CZSi on the precipitation and the defect-free zone (DFZ) formation in Ge-doped CZSi wafers after a three step gettering annealing was studied.
实验结果表明，棒状缺陷和点状缺陷的数量比随低温成核退火时间的增加而减小；对于相同的成核时间，棒状缺陷和点状缺陷的比随成核温度增加开始上升，后来下降。
The experimental results show that the ratio of the bar-like defects to the point-like ones decreases with increase in time of nucleation annealing at a low temperature.
提出用低温长时间退火的方法改善其塑性，通过试验确定了退火工艺制度，使产品的变形性能达到了使用要求。
A method of annealing for a long time at low temperature can be used to improve the plasticity and make the products acceptable.
运用高温-低温-高温三步退火的本征吸除工艺研究了锗的存在对硅片清洁区形成的影响。
The effect of Ge doped in CZSi on the precipitation and the defect-free zone( DFZ) formation in Ge-doped CZSi wafers after a three step gettering annealing was studied.
研究结果表明：与高温精轧相比，低温精轧有利于得到细小及均匀的冷轧退火组织；
The results show that:the sheet with low temperature finish rolling has much finer grain, more homogenous microstructure than that with high temperature finish rolling;
由于我整个样本已退火，我没有第二次机会尝试在较低温度下退火。
Since I annealed the whole sample already, I don't have a second chance to try to anneal it at lower temperature.
由于我整个样本已退火，我没有第二次机会尝试在较低温度下退火。
Since I annealed the whole sample already, I don't have a second chance to try to anneal it at lower temperature.
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