对于在用作集成电路的层间介电体时的改善性能，确定了低介材 料和包含该材料的薄膜及其制备方法。
Low dielectric materials and films comprising same have been identified for improved performance when used as interlevel dielectrics in integrated circuits as well as methods for making same.
对于在用作集成电路的层间介电体时的改善性能，确定了低介材 料和包含该材料的薄膜及其制备方法。
Low dielectric materials and films comprising same have been identified for improved performance when used as interlevel dielectrics in integrated circuits as well as methods for making same.
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