真空沉积法的优势在于它可以制出高品质的薄膜，从而成为高导电性的材料。
The advantage of vacuum deposition is that it's possible to make very high-quality films, which result in materials with higher conductivity.
一旦此工序完成，仅仅是水份被蒸发而所需的电子“三明治”得以保留，整个过程所花费的时间仅为“真空沉积法”的千分之一。
Once that has happened, the water simply evaporates and the desired electronic sandwich is left behind in a thousandth of the time that it would take to make it using vacuum deposition.
采用真空气相沉积法在金刚石表面镀覆强碳化物金属或合金薄膜。
Using vacuum gas phase deposition, diamond surface is coated with strong carbide metal or alloy membrane.
本论文对真空蒸发法和直流溅射法沉积锌膜的工艺进行了研究，结合XRD、SEM、AFM等分析手段，以探索这两种方法在制备锌膜方面的一般规律。
The techniques of depositing zinc thin film on grass substrate by vacuum evaporation and direct-current sputtering were investigated with XRD, SEM and AFM in this paper.
多种工艺可以用来制备透明导电薄膜，如磁控溅射真空反应蒸发、化学气相沉积、溶胶-凝胶法以及脉冲激光沉积等。
Many processes are used to prepare transparent conductive films, such as magnetron sputtering, vacuum reactive evaporation, chemical vapor depositions, Sol-gel, laser-pulsed deposition.
多种工艺可以用来制备透明导电薄膜，如磁控溅射真空反应蒸发、化学气相沉积、溶胶-凝胶法以及脉冲激光沉积等。
Many processes are used to prepare transparent conductive films, such as magnetron sputtering, vacuum reactive evaporation, chemical vapor depositions, Sol-gel, laser-pulsed deposition.
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