真空沉积法的优势在于它可以制出高品质的薄膜，从而成为高导电性的材料。
The advantage of vacuum deposition is that it's possible to make very high-quality films, which result in materials with higher conductivity.
一旦此工序完成，仅仅是水份被蒸发而所需的电子“三明治”得以保留，整个过程所花费的时间仅为“真空沉积法”的千分之一。
Once that has happened, the water simply evaporates and the desired electronic sandwich is left behind in a thousandth of the time that it would take to make it using vacuum deposition.
采用真空气相沉积法在金刚石表面镀覆强碳化物金属或合金薄膜。
Using vacuum gas phase deposition, diamond surface is coated with strong carbide metal or alloy membrane.
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