所述方法利用软蚀刻技术加工所述暴露的接触区。
The method utilizes the soft etching technology to process the exposed contact area.
以紫外光光刻、硅蚀刻及软光刻技术制备了微柱阵列型细胞培养基底。
UV lithography, silicon etching and soft lithography were adopted to fabricate micropillar arrayed cell culture substrates.
主要工艺有：软珐琅、咬版(蚀刻)、冲压、注漆(填油)、丝印、滴胶、压铸、柯式印刷等。
Technology: major soft enamel, bite version (etching), stamping, injection from (fill oil), silk screen, Dijiao, die casting, Kirschner printing.
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