灰度掩模法是一种新的二元光学器件制做方法。
Gray scale mask method is a novel way of fabricating binary optical elements.
用计算机模拟了制作菲涅耳透镜时灰度掩模的曝光量分布和菲涅耳透镜的面形结构。
We simulated the light exposure distribution of the mask and structure of the Fresnel lens in computer.
通过灰度掩模平面不同位置处提供可变的透过率，经一次光刻后得到所需的衍射光学元件。
A variable transmittance is provided to different position on grayscale mask plane and the required diffractive optical elements can be obtained after one-time exposure.
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