灰度掩模法是一种新的二元光学器件制做方法。
Gray scale mask method is a novel way of fabricating binary optical elements.
用计算机模拟了制作菲涅耳透镜时灰度掩模的曝光量分布和菲涅耳透镜的面形结构。
We simulated the light exposure distribution of the mask and structure of the Fresnel lens in computer.
通过灰度掩模平面不同位置处提供可变的透过率，经一次光刻后得到所需的衍射光学元件。
A variable transmittance is provided to different position on grayscale mask plane and the required diffractive optical elements can be obtained after one-time exposure.
讨论了制作适用于近场集成光学头中的凸形、凹形微透镜和折衍射复合微透镜的灰度掩模技术。
The applications of gray scale mask technique in the fabrication of convex and concave microlens and hybrid refraction diffraction microlens are discussed.
该方法采用逐个图形曝光的方式使其具有内在的并行特性，可大大提高灰度掩模的制作速度和精度，并降低生产成本。
This system has intrinsic parallel characteristic owing to its stepper exposure mode, therefore it can improve the manufacturing speed and precision of gray-scale masks with low cost.
在选择掩模平滑算法中，需要计算一幅图像的大量局部窗口的灰度均值和方差。
In selective masking smoothing algorithm, it is needed to calculate grayscale average and variance of a large number of image Windows.
数字掩模技术的核心器件是数字微镜芯片，它具有较高的分辨率和灰度等级等优点。
DMD chip is the core device of digital mask technology, and it has such advantages as high resolve, gray level, and so on.
鉴于以上情况，本文选用了选择式掩模滤波对噪声进行去除，用线性灰度变换方法解决了灰度不均匀的问题。
In view of the above, this paper USES selective masking smoothing to remove noise and linear gray transform method to solve the problem of gray uneven.
该算法利用拉普拉斯微分算子对像素灰度值的不连续性进行量化，根据微分算子对灰度突变的响应强度进行自动调整掩模内的各像素权值。
The algorithm can measure discontinuity of gray values by using Laplacian and adjust automatically gray values according to intensity of response to gray mutation in Laplacian.
该算法利用拉普拉斯微分算子对像素灰度值的不连续性进行量化，根据微分算子对灰度突变的响应强度进行自动调整掩模内的各像素权值。
The algorithm can measure discontinuity of gray values by using Laplacian and adjust automatically gray values according to intensity of response to gray mutation in Laplacian.
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