沉积温度(deposition temperature)、生长物质的碰撞速率(impinging rate of growth species)是两个最重要的影响因素： 单晶薄膜生长：
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... 沉积膜 deposited film 沉积温度 deposited temperature 衬底偏压 substrate bias ...
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...:Sc2O3薄膜 沉积温度 光学性能 结构性能 激光损伤阈值 破坏机理 [gap=1892]Key words:Sc2O3 thin films; substrate temperature; optical properties; microstructure properties; laser induced damage threshold;..
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The result shows that the nano-crystalline diamond film has a higher transmission and a smoother surface at deposition temperature of 640℃and gas pressure of 2.5kPa.
结果表明，在沉积温度为640℃、沉积气压为2．5kPa条件下，可实现高透过率的、光滑的纳米金刚石薄膜。
参考来源 - CVD金刚石薄膜在光电器件中的应用研究Al metal has been also used as metal electrode for its good electricity and thermal properties. However, it may melt under the high deposited temperature.
铝也是电和热的良导体并且还是一种广泛使用的金属电极,但熔点较低(660.37℃),且铝膜的熔点更低,过高的生长温度会使铝膜熔化,所以要在铝膜上沉积GaN薄膜要求沉积温度不能过高。
参考来源 - 在镀铝玻璃衬底上低温沉积GaN薄膜的结晶特性研究The influence of deposition temperature on the optical properties of ZrO 2 films has been also discussed.
同时讨论了不同沉积温度对ZrO2薄膜光学性质的影响。
参考来源 - 期刊学术社区·2,447,543篇论文数据，部分数据来源于NoteExpress
沉积温度升高，沉积深度和均匀性降低。
The depositing uniformity and depth decrease with the depositing temperature increases.
影响扩散层的主要因素是基体材料的成分和沉积温度；
It is the compostiton of bulk material and deposition temperature that mainly affects the diffusion layer.
随着沉积温度的降低，晶粒尺寸减小，晶格失配度增大；
With the increase of deposition temperatures, the crystalline sizes were increased but the crystal lattice distortions were decreased.
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