... 磁镜热核装置 pyrotron 磁控管源 magnetron source 磁流体动力加速器 magnetohydrodynamic accelerator ...
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magnetron ion source 磁控管离子源
magnetron power source 磁控管电源
magnetron sputtering source 磁控溅射源
asymmetric magnetron h -source 非对称磁控管型h
magnetron n ion source 磁控管离子源
The frequency stability of the power source for a feedback LINAC depends on the slow shift, stability and form of power spectrum of the magnetron.
功率反馈电子直线加速器功率源的频率稳定性与磁控管功率谱的慢漂移、谱的稳定性和谱的形状有关。
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.
利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。
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