The frequency stability of the power source for a feedback LINAC depends on the slow shift, stability and form of power spectrum of the magnetron.
功率反馈电子直线加速器功率源的频率稳定性与磁控管功率谱的慢漂移、谱的稳定性和谱的形状有关。
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.
利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。
The utility model relates to a semi-circular column magnetic control sputtering cathode, belonging to a sputtering source component of a magnetron sputtering device.
一种半圆柱磁控溅射阴极，属于磁控溅射装置中的溅射源部件。
In this paper, several thin films samples of vanadium oxide were got by high-frequency Magnetron sputter with pure metal vanadium as sputter source.
本文以高纯金属钒作为靶材，采用磁控溅射工艺制备氧化钒薄膜。
In this paper, several thin films samples of vanadium oxide were got by high-frequency Magnetron sputter with pure metal vanadium as sputter source.
本文以高纯金属钒作为靶材，采用磁控溅射工艺制备氧化钒薄膜。
应用推荐