激光化学气相沉积;激光诱导化学气相沉积;laser induced chemical vapor…… 射频化学气相沉积;radio-frequency chemical vapor depositi…
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激光化学气相沉积;激光诱导化学气相沉积;laser induced chemical vapor…… 射频化学气相沉积;radio-frequency chemical vapor depositi…
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laser induced chemical vapor deposition 激光感生化学气相淀积
Laser induced chemical vapor deposition is the main method among the methods of fabricating nano Si3N4.
激光诱导气相沉积法是制备纳米氮化硅粉末的主要方法之一。
In this study we designed and made the preparation equipment of nano-silicon powder by LICVD (laser induced chemical vapor deposition), and introduced the designing thought of key parts.
本研究自行设计制作了激光诱导化学气相沉积(LICVD)纳米硅粉制备设备，并对关键部件的设计思路进行了阐述。
It is used in many areas. In this paper, the general principles of LICVD (laser induced chemical vapor deposition) were investigated and the measures to reduce dissociated si were put forward.
本文研究了激光诱导化学气相沉积法制备纳米氮化硅的工作原理，提出了减少游离硅的措施，利用双光束激发制备了超微的、非晶纳米氮化硅粉体。
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