plasma etching pe 等离子体刻蚀
Plasma Etching 等离子刻蚀 ; 等离子体刻蚀 ; 等离子蚀刻 ; 等离子腐蚀
plasma-etching 等离子刻蚀
dry plasma etching 等离子干法刻蚀
argon plasma etching 氩等离子刻蚀
oxygen plasma etching o等离子体刻蚀
plasma etching system 等离子体蚀刻系统
plasma etching process 等离子体刻蚀过程
radical plasma etching 自由基等离子体腐蚀
lateral plasma etching 等离子体横向刻蚀
The plasma is a high energy and high activity material, it has good etching effect for any organic material, which in recent years has also been referenced to the printed circuit board manufacturing.
由于等离子体是一种具有很高能量和极高活性的物质，它对于任何有机材料等都具有良好的蚀刻作用，因而在最近几年也被引用到印制电路板制造中来。
In this paper, the result of etching application with microwave plasma will be introduced.
本文介绍微波等离子体刻蚀应用的实验结果。
Therefore, plasma etching anisotropy can be improved by increasing rf frequency or rf-bias power.
因此，等离子体刻蚀的各向异性可以通过增加射频频率和射频功率来改善。
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