... sputtering source ==> 溅射源 sputtering target ==> 溅射靶 sputtering yield ==> 溅射效率,溅镀率,溅镀系数,溅射率,溅射系数 ...
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...平面显示器到一般的玻璃表面涂层, 物理溅镀 (Physical Vapor Deposition) 的 应用愈来愈普遍, 溅镀靶材 (Sputtering Targets) 这种高附加价值的功能性材 料之使用量也就逐年增加, 在庞大市场的诱因之下, 许多溅镀靶材之制造厂家 早已投入可观之研发经费...
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Keywords Aluminum alloy films ,Sputtering targets ,Wiring of IC [gap=122]关键词 铝合金薄膜 溅射靶材 集成电路
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titanium sputtering target 溅射靶材
Manganese sputtering target 锰粉
Zinc oxide sputtering target 锌白
Molybdenum silicide sputtering target 硅化钼
Sputtering target materials 镀膜材 ; 溅射靶材
Niobium oxide sputtering target 五氧化二钶
Boron nitride sputtering target 氮化硼溅射溅射
ALUMINUM ZINC OXIDE sputtering target 异辛酸胍
LCD sputtering target LCD溅射靶材
Sputtering target is usually made of pure molybdenum sheet.
而溅射靶材多以金属纯钼板材为主。
Uses: sputtering target, physical vapor deposition, high temperature alloys.
溅射靶材、物理气相沉积、高温合金。
The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。
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