高密度等离子体CVD HDPCVD
高密度等离子体源 High density plasma sources
高密度等离子体增强型 high density plasma enhanced CVD
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这种装置是在阴极和阳极间用甲烷氢气及氩气产生高密度等离子体射流。
With this apparatus, a plasma jet consisting of a mixture of methane, hydrogen and argon is realized at a high density between the anode and cathode.
介绍了与高密度等离子体工艺相关的模型和数值模拟方法，即连续流和动力学方法。
Methods in modeling and numerical simulation for the high density plasma processing are introduced, namely, continuous and kinetic methods.
在H模式和高密度模式（HDM）下，用光谱方法研究了HL-1等离子体的约束状况。
Plasma confinements under H-mode and high density mode (HDM) in the HL-1 Tokamak have been investigated using spectroscopic method.
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