在几种不同材料的试件表面刻蚀出了试件栅，这种技术的实现使云纹干涉法和精细网格法在高温高压环境下的广泛应用成为可能。
The realization of this teChnique makes it possible to apply the Moire interferometry and lattice method under high-temperature, high-pressure environments.
在处理完成和裂缝闭合时，刻蚀后的表面提供了从储层至井筒的高导流能力的通道。
When the treatment is complete and the fracture closes, the etched surface provides a high-conductivity path from the reservoir to the wellbore.
本文作者认为等离子体轰击高聚物表面引起的局部高温是离子刻蚀后试样表面出现伪迹的重要原因。
The authors think that the high temperature on polymer local surface produced by ion bombardment is the main cause of artifacts on sample surface treated by ion-etching.
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