...直流反应磁控溅射；溅射功率；减反射薄膜；光学特性[gap=1035]Key words: titanium dioxide; DC reactive magnetron sputtering; sputtering power; antireflection; optical property..
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本文采用直流反应磁控溅射工艺，以金属钨为靶材，在玻璃和单晶硅片上沉积了WO 3薄膜。
In this paper, WO3 thin film was deposited on glass substrate and silicon slice by DC reactive magnetron sputtering and using metal tungsten as target.
采用铟锡合金靶(铟锡，90 - 10)，通过直流反应磁控溅射在玻璃基片上制备出ito薄膜，并在大气环境下高温退火处理。
Tin doped indium oxide (ITO) films were deposited on glass substrates by reactive magnetron sputtering using a metallic alloy target (in Sn, 90 10).
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