... 反应性真空溅射 reactive vacuum sputtering 偏压溅射bias sputtering 直流二级溅射direct current diode sputtering ...
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bias sputtering system 偏压溅镀系统
bias sputtering equipment 偏压溅射设备
Modified bias sputtering 调制偏压溅射
negative substrate bias sputtering 衬底负偏压溅射
dc bias-voltage sputtering 直流偏压二极溅射
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This paper mainly deals with the relationship between negative bias of substrate and component phases of magnetron-sputtering ion plated aluminium film of A3 steel.
本文主要论述基板负偏压与A 3钢基体磁控溅射离子镀铝膜相组成的关系。
Quadrupole mass spectrometer was used to analyze the plasma environment of RF magnetron sputtering PTFE target with pulsed bias.
采用四极质谱仪测量了试验参数对高压脉冲增强射频磁控溅射ptfe靶等离子体气氛的影响规律。
Ions sputtering could lead to the decrease of the thickness when the substrate negative bias voltage increases excessively.
负偏压过大对吸附离子产生反溅射作用导致涂层厚度减小。
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