一种用于在高压气体环境中对半导体器件进行退火的新颖方法和设备。
Novel methods and apparatuses for annealing semiconductor devices in a high pressure gas environment.
结合超高压气体放电光源的要求,对玻壳精密退火工艺进行研究。
The process of annealing is studied according to the need of exceed high pressure gas discharge lamp.
本实用新型涉及退火炉内气体排放装置,尤其涉及退火炉防漏热交换器。
The utility model relates to a discharging device for gas inside an annealing furnace, in particular to a leak-proof heat exchanger of the annealing furnace.
本实用新型涉及退火炉内气体排放装置,尤其涉及退火炉防漏热交换器。
The utility model relates to a discharging device for gas inside an annealing furnace, in particular to a leak-proof heat exchanger of the annealing furnace.
应用推荐