一种用于在高压气体环境中对半导体器件进行退火的新颖方法和设备。
Novel methods and apparatuses for annealing semiconductor devices in a high pressure gas environment.
保护气系统：从保护气体发生站至还原退火炉的管道。
Protective gas system: pipe line from the protective gas generation station to reducing annealing furnace.
结合超高压气体放电光源的要求，对玻壳精密退火工艺进行研究。
The process of annealing is studied according to the need of exceed high pressure gas discharge lamp.
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