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本论文中,我们尝试使用一氧化二氮电浆氮化处理,以改善二氧化铪闸极介电层的品质。
In this thesis, we try to use post-deposition N2O plasma nitridation to improve the HfO2 film quality.
youdao
-
本论文中,我们尝试使用一氧化二氮电浆氮化处理,以改善二氧化铪闸极介电层的品质。
In this thesis, we try to use post-deposition N2O plasma nitridation to improve the HfO2 film quality.
youdao