本发明涉及一种离子注入机用的晶片夹，属于半导体装备制造领域。
The invention relates to a wafer clamp for an ion implanter which belongs to the field of semiconductor equipment manufacture.
简单介绍了典型离子注入机的组成，分析了离子注入机中扫描技术的重要性。
Introduced the configuration of typical ion implanter, analyzed the importance of the implantation mechanical scanning technology.
垂直扫描机构是单晶片离子注入机靶盘的支撑部件，起着将高速直线运动从靶室外传递到靶盘的作用。
Vertical scanner is the supporting part of a series process ion implanter, which transfer high speed movement from outside of the chamber to the target inside.
采用无质量分析器的离子注入机，以低能量低剂量注水的方式代替常规SIMOX注氧制备soi材料。
An implanter without ion mass analyzer was used to fabricate thin SOI materials by low energy and low dose water ions implantation instead of conventional SIMOX.
本发明涉及离子注入机imp，包括脉冲等离子体源spl、衬底支承台PPS和所述台的电源alt。
The invention relates to an ion implanter (imp) comprising a pulsed plasma source (SPL), a substrate support plate (PPS) and a power supply (ALT) for said plate.
通过对离子注入机离子源灯丝绝缘子的结构、尺寸、实际工作效果等方面的分析，提出了一种注入机离子源灯丝绝缘子的优化设计。
Based on the analysis of the structure, size, and actual work efficiency of an ion source filament insulator in ion implantation system, an optimization design of the filament insulator is presented.
通过对离子注入机离子源灯丝绝缘子的结构、尺寸、实际工作效果等方面的分析，提出了一种注入机离子源灯丝绝缘子的优化设计。
Based on the analysis of the structure, size, and actual work efficiency of an ion source filament insulator in ion implantation system, an optimization design of the filament insulator is presented.
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