使用X射线光电子能谱仪(XPS)、X射线衍射仪(XRD)、原子力显微镜(afm)对薄膜的结构进行了分析。
The structural properties of the films were analyzed by X ray photo electron spectroscopy (XPS), X ray diffractometer (XRD) and atomic force microscope (AFM).
本文采用原子力显微镜和X射线粉末衍射仪研究了PVA溶液旋转涂膜的溶剂化效应。
The solvent effect on the preparation of PVA film by low speed spin machine was studied by using AFM and XRD.
用原子力显微镜（AFM），扫描电子显微镜（SEM），X 射线粉末衍射仪（XRD），BET 比表面积分析仪对其结构进行了表征。
The structures of RDX/RF aerogel were characterized by atomic force microscopy(AFM), scanning electron microscopy(SEM), X-ray powder diffraction(XRD), and BET method.
通过沉降时间观察其分散性，采用激光粒度仪、扫描电镜、原子力显微镜对分散效果进行进一步分析。
Then the dispersity was evaluated with settlement time. And laser particle size analyzer, SEM and AFM were employed to confirm the results.
本文分别用原子力显微镜、双束紫外可见分光光度计、X-衍射仪等表征了用以上两种方法制备的三氧化钨薄膜。
The tungsten oxide films by two methods were characterized by atomic force microscope, double-beam UV-VIS-NIR spectrophotometer and X-diffractometer.
用紫外-可见吸收光谱仪、接触角测量仪、原子力显微镜对所制备的有序薄膜进行了表征。
The order thin films were characterized by using ultraviolet-visible absorption spectrometry, contact Angle measurement and atomic force microscopy.
X射线衍射仪、电子能谱仪、原子力显微镜和椭圆偏振仪等研究薄膜的击穿电压、介电常数、晶体结构、化学成分、表面形貌及薄膜的折射率。
The breakdown voltage, permittivity, crystal structure, composition, surface and refractive index of the thin films were studied by I-V, C-V, XRD, EDS, AFM and elliptical polarization instrument.
X射线衍射仪、电子能谱仪、原子力显微镜和椭圆偏振仪等研究薄膜的击穿电压、介电常数、晶体结构、化学成分、表面形貌及薄膜的折射率。
The breakdown voltage, permittivity, crystal structure, composition, surface and refractive index of the thin films were studied by I-V, C-V, XRD, EDS, AFM and elliptical polarization instrument.
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