常规的化学蒸发沉淀涂层工艺需要一种容易在相当低温度下挥发并且在较高温度下与基体接触时能分解成纯金属的金属化合物。
Conventional CVD coating process requires a metal compound that will volatilize at a fairly low temperature and decompose to a metal when it contacts with the substrate at higher temperature.
研究了高温条件下无助剂沉淀铁催化剂在固定床积分反应器中的F-T合成反应。
The Fischer-Tropsch synthesis was studied in an integral fixed-bed reactor with the un promoted precipitated iron catalyst under the high temperature.
重掺砷硅单晶在中高温退火时形成密度较高的氧沉淀及诱生缺陷。
The experimental results showed that high density of oxygen precipitation and induced-defects were formed after annealing of wafers at moderate and high temperatures.
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