研究了所制备薄膜的厚度、颗粒度等与薄膜制备过程中激光脉冲频率、引弧电压和靶材—衬底间距等工作参数之间的对应关系。
We studied the relationship between the films thickness, grain size and deposition parameters, i. e. pulse laser frequency, striking voltage and distance from the target to the substrate.
在实验中采用了薄靶厚衬底新方法。
The method of thin target with thick substrate was used in the experiment.
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