在同步辐射X射线光刻中，由于掩模的初始张应力和掩膜的非均匀受热将使掩模产生热畸变。
In synchrotron radiation X-Ray lithography, distortion of mask is caused by its initial tension, stress and inhomogeneous thermal effect.
在经典电动力学的基础上，讨论了辐射阻尼影响下非相对论性带电粒子在均匀磁场中的经典运动。
On the basis of classical electrodynamics, the classical motion of non-relativistic charged particle affected by radiantly damping force in equally magnetic field was discussed in the peper.
在本人的工作中，我试图用一个非均匀喷流模型来解决这些天体的辐射机制。
In my work, I try to resolve emissive mechanisms of these objects with an inhomogeneous jet model.
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