虽然示例中使用的资源适配器不响应J2EE事务性隔离级别设置的变化，但是某些围绕关系数据库系统构建的EIS确实可能会受到影响。
Although resource adapters used in the example do not respond to changes in J2EE transactional isolation level Settings, some EISs built around relational database systems may be affected.
侧板后掠角大小和整流罩位置变化时，对进气道的质量捕获、总压恢复系数和隔离段出口流场的均匀性等都有一定的影响。
Changes of sidewall sweep Angle and cowl position can influence inlet performance such as mass capture, total pressure recovery coefficient and uniformity of isolator exit flow field.
整流罩位置为25%的三维侧压进气道可以获得较高质量捕获和总压恢复系数，且隔离段出口流场比较均匀。
And three-dimensional sidewall compression inlet with 25 percent cowl position has high mass capture and total pressure recovery coefficient and isolator exit flow flied is homogeneous.
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