虽然示例中使用的资源适配器不响应J2EE事务性隔离级别设置的变化，但是某些围绕关系数据库系统构建的EIS确实可能会受到影响。
Although resource adapters used in the example do not respond to changes in J2EE transactional isolation level Settings, some EISs built around relational database systems may be affected.
侧板后掠角大小和整流罩位置变化时，对进气道的质量捕获、总压恢复系数和隔离段出口流场的均匀性等都有一定的影响。
Changes of sidewall sweep Angle and cowl position can influence inlet performance such as mass capture, total pressure recovery coefficient and uniformity of isolator exit flow field.
它端口与端口之间的隔离度除与它本身的环行状态有关外，还与第三端口外接负载的反射系数有关。
The isolation at port and port between be differ that in addition to itself circulation state, and yet relate with the reflection-coefficient of external connective load at the three port.
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