介绍了真空微电子中金属尖阴极的制备方法。
This paper describes the method of metal tip fabrication for vacuum microelectronics.
本文介绍了真空微电子器件场发射金属尖阵列阴极的制备工艺技术。
This paper describes a fabrication technology of metal tip field emission arrays (FEA) for the vacuum microelectronic devices.
为满足大电流密度电子发射的需要，对锑铯光电阴极的制备工艺进行了研究。
To meet the needs of high electron current density photocathodes, the processes for preparing cesium antimonide have been studied.
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