Amorphous silicon(a-Si) thin films were deposited on glass substrate by PECVD,and polycrystalline silicon(poly-Si) thin films were prepared by aluminum-induced crystallization(AIC).
采用金属铝诱导晶化非晶硅薄膜的方法制备多晶硅薄膜。
参考来源 - 铝诱导非晶硅薄膜快速低温晶化研究·2,447,543篇论文数据,部分数据来源于NoteExpress
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