用高速显微摄影技术对强流脉冲电子束轰击钽金属靶的过程进行了研究,获得了“神龙一号”加速器上靶材回喷过程的实验图像。
The high speed microscope photography has been used to study on the back-ejecta of tantalum target in DRAGON ONE impacted by high intensity current pulse electron beam.
本发 明在钽作为靶材在溅射机上使用,各方面性能达到设计要求。
The sputtering ring is used on the sputtering machine using tantalum as target, and performance on every aspect reaches the requirement of design.
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