本文采用直流反应磁控溅射工艺，以金属钨为靶材，在玻璃和单晶硅片上沉积了WO 3薄膜。
In this paper, WO3 thin film was deposited on glass substrate and silicon slice by DC reactive magnetron sputtering and using metal tungsten as target.
本研究以电浆电弧为加热源蒸发钨靶材，并藉由气凝合成机制，外加一套吹气装置制备氧化钨奈米棒，分别探讨腔体压力与奈米棒平均直径及产率的关系。
In the present study, tungsten oxide nanorods were prepared by a plasma arc gas condensation technique where a gas nozzle was introduced to provide blowing gas.
产品方案：高密度合金500吨，棒材、钨结构件、稀土钨、铜钨合金各50吨，银合金10吨。
Products: 500 tons heavy alloy, each 50 tons for rods, structure parts, crucibles and W-Cu alloy, 10 tons W - Ag alloy.
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