金刚石膜是指用低压或常压化学气相沉积(CVD)方法人工合成的金刚石膜。金刚石膜的制备方法有热化学气相沉积(TCVD)和等离子体化学气相沉积(PCVD)两大类。
这说明了在金刚石膜中存在明显的应力不均。
This demonstrates a significant inhomogeneity of stress in diamond films.
利用压力爆破技术测量了圆形金刚石膜的断裂强度。
The fracture strength of circular diamond film was measured by a burst pressure technique.
以甲烷为碳源气体，用直流等离子射流法制备了金刚石膜。
Thick diamond films were deposited by DC plasma jet using methane as carbon source.
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