采用直流磁控溅射法在清洁玻璃基片上制备了掺钨氧化铟（IWO）透明导电氧化物薄膜。
Transparent conductive, tungsten-doped indium oxide(IWO) films with the high carrier molbility were grown by magnetron sputtering on glass substrates, followed by in-situ annealing.
综述了透明导电氧化物（TCO）薄膜的结构、光电性能以及TCO薄膜制备技术的研究进展。
Progresses in research on microstructure, electrical and optical properties and preparation technology of TCO thin films are reviewed.
透明导电氧化物（TCO）材料由于它的特殊性质，在平板显示器和太阳能电池等方面得到了广泛的应用。
Transparent conducting oxide(TCO)materials have many special properties, so they can be used in many application fields such as flat panel displays and solar cells.
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