提出了针对大视场投影光刻物镜畸变的计算方法，并在完成的畸变特性测量装置上进行了8英寸的硅片测量。

The calculative method of the large field projection lithography lens is presented, and on the distortion measuring setup which is accomplished, distortion measurement of 8 inch wafer is completed.

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课程主要包括：概念设计、布局、实施、广告技术，比如雕刻技术、蚀刻、丝网印刷、光刻技术、透印版印刷、绘图和漫画、绘图、拼贴画及计算机绘图。

Course concepts include: concept design. layout. paste-up. and techniques such as engraving. etching. silkscreen. lithography. offset. drawing and cartooning. painting. collage. and computer graphics.

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制备基底的方法，测量方法，器件制造方法，光刻装置，计算机程序和基底。

Method of preparing a substrate, method of measuring, device manufacturing method, lithographic apparatus, computer program and substrate.

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