最后，采用各项异性的离子束(IBM)加工技术可以通过掩膜来蚀刻孔阵，以制成纳米多孔金属材料。
Last, a technique known as anisotropic ion beam milling (IBM) is used to etch through the mask to make an array of holes, creating the nanoporous metal.
高能重离子在绝缘材料表面产生的潜径迹经过蚀刻后形成一定形貌的核径迹孔，而密集的径迹孔表面相当于渐变折射率层。
High energy heavy ions generate potential tracks on the face of insulated material, and a porous surface with gradient refractive index can be formed by etching the ion tracks.
一第一层间导电接孔形成于且穿过一层间介电层以及一介电蚀刻停止层。
A first interlayer conductive joint hole is formed on and through an interlayer dielectric layer and a dielectric etch stop layer.
应用推荐