... 溅射介质薄膜 sputtered dielectric film 溅射热电薄膜探测器 pyroelectric sputtered thin film detecror 薄膜溅射 thin film sputtering ...
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从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。
The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
磁控溅射已经成为沉积薄膜的最重要的方法之一。
Magnetron sputtering has become one of the most important methods for depositing thin films.
随着溅射时间的延长，薄膜厚度增加。
When the sputtering time prolongs, the films become thicker.
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