还详细讨论了卤素原子在金刚石薄膜淀积过程中的作用。
Also, the functions of halogen atoms in CVD diamond deposition process are discussed in detail in this paper.
揭示了常规热丝法薄膜淀积工艺中热钨丝易断裂的原因。
The reason why tungsten wire is easy to break in the silicon thin film deposition process by hot wire deposition method was explained.
通过相图讨论了系统压力、激活温度和氟含量对低压金刚石薄膜淀积条件的影响，可以为实验研究提供理论指导。
The principles of effect of system pressure, activation temperature and content of fluorine were obtained by the phase diagrams.
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