介绍了一种新的镀膜技术—过滤式真空电弧离子镀膜技术。
A technique - filtered vacuum arc ion coating for thin film deposition-is reviewed in this paper.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
一种新的镀膜技术——电弧放电离子镀研制成功。
A new coating technology, arc discharge ion plating has been developed.
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