用微弧氧化的方法在铸造铝-硅合金基体上获得陶瓷层。

Ceramic coating was obtained by micro arc oxidation on the substrate of casted aluminum silicon alloy.

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本研究采用常压化学气相沉积（CVD）的方法在金属铝基底上制备出硅氧化合物陶瓷膜层。

A new kind of silicon oxidic film on aluminum was prepared by chemical vapor deposition (CVD) in ambient pressure.

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