目前所知的太阳能电池的制程种类有下列的区分:(1) 矽制程(silicon processing)(2) 薄膜制程(thin-film processing)(3) 高分子制程(polymer processing)(4) 奈米粒制程
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而IBM芯片制造技术联盟中的另一个重要成员三星则最近公布了其20nm制程技术的有关消息,这种制程技术也是基于平面型体硅CMOS。
Samsung Electronics Co. Ltd., one of the members of IBM's "fab club" or technology alliance, recently rolled out its 20-nm process, which is based on bulk CMOS.
这款产品将使用Intel第三代HKMG工艺,第五代硅应变技术,另外与32nm类似,22nm制程仍将继续使用193nm液浸式光刻技术。
It will also use copper interconnects, low-k, strain silicon and other features. Like 32-nm, Intel will make use of 193-nm immersion lithography.
利用一化学机械研磨制程,移除该氧化 物层的部分区域,以使该填满沟槽的氧化物层与该第一多晶硅层 大体上齐平。
Through a CMP process, portions of the oxide layer are removed to substantially planarize the trench-filled oxide layer as the first polysilicon layer.
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