真空室壁经过碳化、硅化等处理得到高温度稳定约束的ULQ等离子体。
ULQ plasma with fine confinement and high temperature is obtained after wall carbonization and siliconization.
本文叙述了在HT - 6b托卡马克装置上，采用脉冲放电清洗去除真空室壁表面杂质的初步实验结果。
This paper describes the experiment results on removing impurities from vacuum wall by means of pulse discharge cleaning in the HT-6B Tokamak device.
此时所测到的环向电流中绝大部分是流经厚壁真空室的电流。
Most of the measured toroidal current is the current passing through the thick vacuum chamber.
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