Concerning producing processes of TiNi SMA. thin films, cold rolling of thin wires and DC magnetron sputtering are studied.
在TiNi形状记忆合金薄膜制备方面，研究了丝材冷轧法及直流磁控溅射法制膜工艺。
参考来源 - TiNi形状记忆合金薄膜制备工艺及其单元互联微执行器研究Hydrogen-free diamond-like films and silicon incorporated diamond-like carbon films were deposited by direct current magnetron sputtering with Ar gas, graphite and silicon chips on the single-crystal silicon and optical glass substrates.
本文采用直流磁控溅射方法,以普通光学玻璃和单晶硅为基底,Ar为工作气体和石墨以及硅片为靶材,制备无氢类金刚石薄膜和掺硅类金刚石薄膜。
参考来源 - 掺硅类金刚石薄膜的制备、结构及光学性质VOx films with high TCR are reported. The VOx filems are fabricated by DC magnetron sputtering with a highly pure vanadium metal(99.99%) as target.
讨论了在低温下以高纯金属钒作靶材,用直流磁控溅射的方法制备出了氧化钒薄膜。
参考来源 - 直流磁控溅射制备氧化钒薄膜In this paper,the ZnMnO thin films have been prepared by direct current magnetron sputtering on glasses studied by combining theory and experiment studies. The structural and optical properties of ZnMnO thin films have been systemically investigated.
本文采用理论分析与物理实验相结合的研究方法,利用直流磁控溅射法在玻璃衬底上生长出ZnMnO薄膜。
参考来源 - Mn掺杂氧化锌薄膜的制备与光学特性的研究·2,447,543篇论文数据，部分数据来源于NoteExpress
采用直流磁控溅射法溅射纯度为99.999%的铝靶制备了超薄铝膜。
Ultrathin aluminum films were prepared by DC reactive magnetron sputtering. The target was made by 99.999% pure aluminum.
采用直流磁控溅射工艺，室温下在载玻片上制备了氧化锌铝透明导电薄膜。
ZnO: Al thin films were prepared on slide glass substrates by non-reactive DC magnetron sputtering at room temperature.
获得了直流磁控溅射法制备具有良好光电特性的ZMO薄膜的最佳工艺条件；
The experimental condition of DC magnetron sputtering for ZMO films with good optical and electric properties has been established.
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