本实用新型可保护薄膜不受污染，提高半导体集成电路生产过程中的照相平版印刷质量。
The utility model can protect the film from pollution and increases the printing quality of photolithography during the production of semiconductor integrated circuits.
该业务部门的技术能力包括照相平版印刷、微蚀刻和小规模散热技术。
The business unit's capabilities including photolithography, micro-etch and small scale thermal dissipation technology.
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