本研究自行设计制作了激光诱导化学气相沉积(LICVD)纳米硅粉制备设备，并对关键部件的设计思路进行了阐述。

In this study we designed and made the preparation equipment of nano-silicon powder by LICVD (laser induced chemical vapor deposition), and introduced the designing thought of key parts.

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利用激光诱导化学镀技术，首次在硅片上沉积出金属镍。

Deposition of metallic nickel on silicon substrate by laser-enhanced electroless plating technique is reported for the first time.

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本文研究了激光诱导化学气相沉积法制备纳米氮化硅的工作原理，提出了减少游离硅的措施，利用双光束激发制备了超微的、非晶纳米氮化硅粉体。

It is used in many areas. In this paper, the general principles of LICVD (laser induced chemical vapor deposition) were investigated and the measures to reduce dissociated si were put forward.

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