... 视觉清洁 visibly clean 湿法清洗 wet process cleaning 在敏感环境或含有有害物的建筑中进行清洗，或用户有特殊要求的情况下，宜实施工程监控措施。具体监控措施见附录A。 ...
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国际上已经对这一缺陷的形成有了一定的理论分析，也提出了可以通过湿法清洗来去除此缺陷。
Some certain researches and theoretical analysis on it were carried out, and wet clean method was proposed for removing the pad crystal defect.
在有图形的片子上得到的扫描电镜检查结果显示了在等离子去胶和随后的湿法清洗后的清洁度、良好的图形轮廓和图形结构的关键尺寸保持情况。
SEM inspection results obtained on patterned wafers show the cleanliness, good profile and CD retention of the structures after the He:H2 plasma strip and subsequent wet cleans.
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