A:\zwxin.htm 关键词］ 氮化碳薄膜；光学性质；射频溅射；电子结构 [gap=1245]Key words］ carbon nitride thin film; optical property; sputtering; electron structure
基于12个网页-相关网页
... 氮化碳薄膜 carbon nitride film 氮化铁 nitride iron 氮化铁薄膜 iron nitrides thin films ...
基于10个网页-相关网页
Carbon nitride thin films were prepared by dc. magnetron sputtering and microwave plasma enhanced chemical vapor deposition(MPCVD) on A^Os ceramic substrates with Ti coatings as interlayers. Field emission properties of carbon nitride films were measured in high vacuum chamber.
本文分别采用直流磁控溅射技术和微波等离子体增强化学气相沉积（MPCVD）技术在镀钛氧化铝陶瓷衬底上制备了氮化碳薄膜，并研究了样品的场致电子发射特性，发现氮化碳薄膜的场致发射特性与其沉积条件有密切的关系。
参考来源 - 氮化碳薄膜场致电子发射特性研究·2,447,543篇论文数据，部分数据来源于NoteExpress
应用推荐