气相掺杂指通过气相使杂质进入半导体的技术。
磷化氢(PH3)是一种重要的电子特气,主要用于n型半导体的掺杂、离子注入和化学气相沉积(CVD)等。
Phosphine (PH3) is an important electronic specific gas which is mainly used in fields of N-type semiconductor doping, ion implement and chemical vapor deposition (CVD) etc.
以硅烷和氧化二氮作为反应气体,采用等离子体增强化学气相沉积(PECVD)技术,不使用掺杂,在单晶硅衬底上制备了用于平面光波导的二氧化硅薄膜。
Without doping, plasma enhanced chemical vapor deposition (PECVD) of silica films on si substrates with gas mixtures of SiH_4 and N_2O is considered.
应用推荐