此外，栅格大小与制造设计掩模的最小化电子束点大小成比例。
Additionally, the grid size is proportional to the minimum electron-beam-spot size used to create the masks for the design.
在转化过程中，选用不同的栅格大小，其面积和精度损失是不同的。
How the area accuracy loss during rasterizing needs to be answered when the different grid size is adopted in order to choice a suitable grid size.
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