通过分析曝光系统的构成和其中的关键技术，探讨了国内研制相关曝光设备所面临的挑战。
By showing the composition and key technologies of the exposure system, the challenges in development of lithography instrument are discussed.
曝光时间|捕获设备的曝光时间。
Exposuretime | exposure time | exposure time of the capture device.
曝光机是图形转移中的重要设备。
Exposure machine is a key equipment in the graphic transitions.
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