由XRD实验结果可知，热处理后镀层的晶体结构未发生改变。
It was revealed from results of XRD that the crystal structure of coating had not changed after heat treatment.
现有的生长装置存在镀金不方便、镀层不均匀、晶体生长应力大等弊端。
Existing growing device has shortcomings that gold plating is not convenient, plating layer is not uniform, and crystal growth has great stress.
镀层中晶体取向具有轴向织构的特征。
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